High-Resolution Spin-on-Patterning of Perovskite Thin Films for a Multiplexed Image Sensor Array

Inorganic–organic hybrid perovskite thin films have attracted significant attention as an alternative to silicon in photon-absorbing devices mainly because of their superb optoelectronic properties. However, high-definition patterning of perovskite thin films, which is important for fabrication of the image sensor array, is hardly accomplished owing to their extreme instability in general photolithographic solvents. Here, a novel patterning process for perovskite thin films is described: the high-resolution spin-on-patterning (SoP) process. This fast and facile process is compatible with a variety of spin-coated perovskite materials and perovskite deposition techniques. The SoP process is successfully applied to develop a high-performance, ultrathin, and deformable perovskite-on-silicon multiplexed image sensor array, paving the road toward next-generation image sensor arrays.

A high-resolution, high-definition patterning method of perovskite thin films is reported. The patterning method (spin-on-patterning) is based on wetting/dewetting behavior of perovskite precursor solution during the spin-coating process. This fast and facile process is compatible with various solution-processing perovskite deposition techniques. By using this method, a high-performance, ultrathin, and deformable perovskite-on-silicon multiplexed image sensor array is successfully achieved.

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