A highly reliable memristor array using floating-gate memory operated by two terminals (source and drain) using van der Waals' layered materials is demonstrated by Young Hee Lee, Woo Jong Yu, and co-workers in article number 1703363. Centimeter-scale samples with MoS2 as a channel and graphene as a trap layer grown by chemical vapor deposition are used for array fabrication, with Al2O3 as a tunneling barrier. This work opens up the possibility to realize reliable and flexible memristors.
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